CURRENT-VOLTAGE CHARACTERISTIC OF REACTIVE SPUTTERING WITH ELEMENT TARGETSSALM J; STEENBECK K; STEINBEISS E et al.1979; PHYS. STATUS SOLIDI, A; DDR; DA. 1979; VOL. 54; NO 1; PP. K23-K26; BIBL. 4 REF.Article

ON PROBLEMS OF REACTION KINETICS DURING DEPOSITION OF SILICON OXIDE FILMS BY REACTIVE SPUTTERING OF SILICON IN A MAGNETRON SPUTTERING SYSTEMBRODKORB W; SALM J; STEINBEISS C et al.1980; PHYS. STATUS SOLIDI (A), APPL. RES.; ISSN 0031-8965; DDR; DA. 1980; VOL. 57; NO 1; PP. K49-K53; BIBL. 6 REF.Article

Discussion of possible surface processes during the reactive SiO_x film deposition in a planar magnetron sputtering equipmentBRODKORB, W; SALM, J; STEINBEISS, E et al.Physica status solidi. A. Applied research. 1984, Vol 84, Num 2, pp 379-386, issn 0031-8965Article

Low pressure sputtering for the preparation of HTSC films and multilayersSCHÜLER, T; STEINBEISS, E; BRUCHLOS, G et al.Physica status solidi. A. Applied research. 1992, Vol 134, Num 1, pp K25-K28, issn 0031-8965Article

Discussion of possible surface processes during the reactive SiO_x film deposition in a planar magnetron sputtering equipment = Discussion portant sur les différents processus de surface au cours de la déposition réactive de la couche mince SiO_x dans une installation plane de pulvérisation par magnétron = Diskussion der moeglichen Oberflaechenprozesse waehrend der reaktiven SiO_x-Duennschichtabscheidung in einer ebenen Magnetronsputter-AusruestungBRODKORB, W; SALM, J; STEINBEISS, E et al.Physica status solidi. A. Applied research. 1984, Vol 84, Num 2, pp 379-386, issn 0031-8965Article

A High-T_c superconductor bolometer on a silicon nitride membraneSANCHEZ, S; ELWENSPOEK, M; HEIDENBLUT, T et al.Journal of microelectromechanical systems. 1998, Vol 7, Num 1, pp 62-68, issn 1057-7157Conference Paper

Preparation and properties of barium-ferrite-containing glass ceramicsMÜLLER, R; ULBRICH, C; SCHÜPPEL, W et al.Journal of the European Ceramic Society. 1999, Vol 19, Num 6-7, pp 1547-1550, issn 0955-2219Conference Paper

Epitaxial Tl-Ba-Ca-Cu-O films : preparation, properties and applicationsSTEINBEISS, E; MANZEL, M; SCHMIDT, H. G et al.Vacuum. 1996, Vol 47, Num 9, pp 1117-1122, issn 0042-207XArticle

Low voltage magnetron discharges for thin film preparationSTEENBECK, K; STEINBEISS, E; WINKLER, S et al.Vacuum. 1990, Vol 42, Num 1-2, pp 39-41, issn 0042-207X, 3 p.Conference Paper

Noise of high-Tc superconducting bolometersKHREBTOV, I. A; LEONOV, V. N; TKACHENKO, A. D et al.SPIE proceedings series. 1998, pp 288-299, isbn 0-8194-2726-8Conference Paper

High-T_c Josephson junctions and DC SQUIDsSEIDEL, P; HEINZ, E; MICHALKE, W et al.IEEE transactions on applied superconductivity. 1993, Vol 3, Num 1, pp 2353-2356, issn 1051-8223, 4Conference Paper

TiBaCaCuO-films for passive microwave devicesMANZEL, M; BRUCHLOS, H; STEINBEISS, E et al.Physica. C. Superconductivity. 1992, Vol 201, Num 3-4, pp 337-339, issn 0921-4534Article

LaSr-manganate powders by crystallization of a borate glassMÜLLER, R; SCHÜPPEL, W; EICK, T et al.Journal of magnetism and magnetic materials. 2000, Vol 217, Num 1-3, pp 155-158, issn 0304-8853Article

Magnetic glass ceramics : preparation and propertiesKLUPSCH, T; STEINBEISS, E; MÜLLER, R et al.Journal of magnetism and magnetic materials. 1999, Vol 196-97, pp 264-265, issn 0304-8853Conference Paper

Noise of high-Tc superconducting films and bolometersKHREBTOV, I. A; LEONOV, V. N; LAUKEMPER, J. K et al.Journal de physique. IV. 1998, Vol 8, Num 3, pp Pr3.293-Pr3.296, issn 1155-4339Conference Paper

Different sputtering methods for the deposition of high-T_c superconducting thin filmsSTEINBEISS, E; BRUCHLOS, H; EICK, T et al.Vacuum. 1993, Vol 44, Num 11-12, pp 1113-1117, issn 0042-207XConference Paper